Development of silicon carbide (SiC) micro vertical transverse field effect transistors

Abstract

Simulation with a finite element method has become a major and important tool that can explain the physical behavior of electronic devices. Data from constructed devices are taken as input and with a feedback process between the results and the measurements; one can explain the operation of the device. This has been achieved to an excellent degree in silicon electronics, since silicon is the most well known semiconductor material, but not in Silicon carbide. Silicon carbide (SiC) has been extensively used only recently and both the physical models and their parameters are susceptible to many improvements, since there are several ambiguities – uncertainties which are observed during simulation. Many publications contain simulation results, but only a few describe accurately the simulation models and their parameters. The aim of this work is to establish an explicit procedure for achieving reliable TCAD simulation results. For this purpose the physical parameters and properties of 4H-SiC ...
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DOI
10.12681/eadd/43707
Handle URL
http://hdl.handle.net/10442/hedi/43707
ND
43707
Alternative title
Ανάπτυξη μικρομετρικών τρανζίστορ εγκάρσιου πεδίου από καρβίδιο του πυριτίου (SiC)
Author
Stefanakis, Dionysios (Father's name: Zacharias)
Date
2018
Degree Grantor
Aristotle University Of Thessaloniki (AUTH)
Committee members
Τάσσης Δημήτριος
Ζεκεντές Κωνσταντίνος
Δημητριάδης Χαράλαμπος
Φράγκης Νικόλαος
Μπούχερ Ματτίας
Κωνσταντινίδης Γεώργιος
Ξανθάκης Ιωάννης
Discipline
Natural SciencesPhysical Sciences
Engineering and TechnologyElectrical Engineering, Electronic Engineering, Information Engineering
Keywords
Power diodes; Vertical field effect transistor (VJFET); Silicon Carbide 4H-SiC; TCAD simulation
Country
Greece
Language
English
Description
298 σ., im., tbls., fig.
Rights and terms of use
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